SNYDER, Rose M., SANKAR, Sriram, BHATT, Prajna, RIAZ, Aysha A., THAKUR, Pardeep K., LEE, Tien-Lin, REGOUTZ, Anna, SUSARLA, Sandhya und BIRKEL, Christina, 2025. High-yield delamination of hydrothermally-etched V2 CTx. Chemistry of materials. 2025. No. Band 64, Heft 10 (2025), Seite 4761-4765, p. , Heft 10 (2025), Seite 4761-4765. DOI 10.1021/acs.inorgchem.4 c04546.
Elsevier - Harvard (with titles)Snyder, R.M., Sankar, S., Bhatt, P., Riaz, A.A., Thakur, P.K., Lee, T.-L., Regoutz, A., Susarla, S., Birkel, C., 2025. High-yield delamination of hydrothermally-etched V2 CTx. Chemistry of materials , Heft 10 (2025), Seite 4761-4765. https://doi.org/10.1021/acs.inorgchem.4 c04546
American Psychological Association 7th editionSnyder, R. M., Sankar, S., Bhatt, P., Riaz, A. A., Thakur, P. K., Lee, T.-L., Regoutz, A., Susarla, S., & Birkel, C. (ca. 2025). High-yield delamination of hydrothermally-etched V2 CTx [Electronic]. Chemistry of materials, Band 64, Heft 10 (2025), Seite 4761-4765, , Heft 10 (2025), Seite 4761-4765. https://doi.org/10.1021/acs.inorgchem.4 c04546
Springer - Basic (author-date)Snyder RM, Sankar S, Bhatt P, Riaz AA, Thakur PK, Lee T-L, Regoutz A, Susarla S, Birkel C (2025) High-yield delamination of hydrothermally-etched V2 CTx. Chemistry of materials , Heft 10 (2025), Seite 4761-4765. https://doi.org/10.1021/acs.inorgchem.4 c04546
Juristische Zitierweise (Stüber) (Deutsch)Snyder, Rose M./ Sankar, Sriram/ Bhatt, Prajna/ Riaz, Aysha A./ Thakur, Pardeep K./ Lee, Tien-Lin/ Regoutz, Anna/ Susarla, Sandhya/ Birkel, Christina, High-yield delamination of hydrothermally-etched V2 CTx, Chemistry of materials 2025, , Heft 10 (2025), Seite 4761-4765.