SIMON, Nicolai, STIEGLITZ, Thomas und BUCHER, Volker, 2025. Area selective atomic layer deposition for the use on active implants: an overview of available process technology. Freiburg: Universität.
Elsevier - Harvard (with titles)Simon, N., Stieglitz, T., Bucher, V., 2025. Area selective atomic layer deposition for the use on active implants: an overview of available process technology. Universität, Freiburg. https://doi.org/10.1002/adhm.202403149
American Psychological Association 7th editionSimon, N., Stieglitz, T., & Bucher, V. (ca. 2025). Area selective atomic layer deposition for the use on active implants: an overview of available process technology [Cd]. Universität. https://doi.org/10.1002/adhm.202403149
Springer - Basic (author-date)Simon N, Stieglitz T, Bucher V (2025) Area selective atomic layer deposition for the use on active implants: an overview of available process technology. Universität, Freiburg
Juristische Zitierweise (Stüber) (Deutsch)Simon, Nicolai/ Stieglitz, Thomas/ Bucher, Volker, Area selective atomic layer deposition for the use on active implants: an overview of available process technology, Freiburg 2025.