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ISO-690 (author-date, English)

DEUERMEIER, Jonas, WARDENGA, Hans, MORASCH, Jan, SIOL, Sebastian, NANDY, Suman, CALMEIRO, Tomás, MARTINS, Rodrigo, KLEIN, Andreas und FORTUNATO, Elvira, 2016. Highly conductive grain boundaries in copper oxide thin films. Melville: AIP Publishing.

Elsevier - Harvard (with titles)

Deuermeier, J., Wardenga, H., Morasch, J., Siol, S., Nandy, S., Calmeiro, T., Martins, R., Klein, A., Fortunato, E., 2016. Highly conductive grain boundaries in copper oxide thin films. AIP Publishing, Melville. https://doi.org/10.26083/tuprints-00019920

American Psychological Association 7th edition

Deuermeier, J., Wardenga, H., Morasch, J., Siol, S., Nandy, S., Calmeiro, T., Martins, R., Klein, A., & Fortunato, E. (ca. 2016). Highly conductive grain boundaries in copper oxide thin films [Cd]. AIP Publishing. https://doi.org/10.26083/tuprints-00019920

Springer - Basic (author-date)

Deuermeier J, Wardenga H, Morasch J, Siol S, Nandy S, Calmeiro T, Martins R, Klein A, Fortunato E (2016) Highly conductive grain boundaries in copper oxide thin films. AIP Publishing, Melville

Juristische Zitierweise (Stüber) (Deutsch)

Deuermeier, Jonas/ Wardenga, Hans/ Morasch, Jan/ Siol, Sebastian/ Nandy, Suman/ Calmeiro, Tomás/ Martins, Rodrigo/ Klein, Andreas/ Fortunato, Elvira, Highly conductive grain boundaries in copper oxide thin films, Melville 2016.

Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.