• Cryogenic Plasma Etching Proce...

*Result*: Cryogenic Plasma Etching Process Optimization Using a Wireless CryoTemp™ Metrology Wafer

Title:
Cryogenic Plasma Etching Process Optimization Using a Wireless CryoTemp™ Metrology Wafer
Authors:
Zhang, Xiafang, Tse, Poklam, Akriti, Akriti, Matsuoka, Hironori, Xu, Qing, Shenai, Anish
Source:
2025 36th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) SEMI Advanced Semiconductor Manufacturing Conference (ASMC), 2025 36th Annual. :1-4 May, 2025
Relation:
2025 36th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
Database:
IEEE Xplore Digital Library